Reticles Handling Automation System from Japan
Robotic SMIF-compatible pod handling system for clean transfer of photomasks between manufacturing tools. Essential apparatus for mask manufacturing workflow under HTS 8486.40.0010.
Duty Rate — Japan → United States
0%
Rate breakdown
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Document cleanroom particle performance (Class 1) and pod compatibility specs
• Include robotic repeatability data (<5μm) and throughput specifications
• Distinguish from general factory automation through semiconductor cleanroom design