Reticles Chrome Deposition Chamber from Mexico
Sputtering system depositing uniform chrome thin films on quartz substrates for photomask blanks. Front-end mask manufacturing equipment qualifying for HTS 8486.40.0010.
Duty Rate — Mexico → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Document film thickness uniformity (<1%) and deposition rate specifications
• Include substrate heater temperature control for stress management
• Avoid Chapter 84 vacuum coating classification by proving mask-specific design