OPC Mask Verification Station from China

Automated station verifying optical proximity correction patterns on advanced photomasks using AIMS simulation. Critical mask manufacturing validation tool under HTS 8486.40.0010.

Duty Rate — China → United States

25%

Rate breakdown

9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter

Import Tips

Include aerial image simulation specs matching scanner illumination conditions

Document pattern fidelity measurement algorithms and throughput (>10 masks/hour)

Distinguish from wafer-level verification equipment through mask handling design