OPC Mask Verification Station from China
Automated station verifying optical proximity correction patterns on advanced photomasks using AIMS simulation. Critical mask manufacturing validation tool under HTS 8486.40.0010.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Include aerial image simulation specs matching scanner illumination conditions
• Document pattern fidelity measurement algorithms and throughput (>10 masks/hour)
• Distinguish from wafer-level verification equipment through mask handling design