EUV Mask Blank Inspection Tool from China
Deep ultraviolet inspection system for detecting defects in extreme ultraviolet (EUV) mask blanks before patterning. HTS 8486.40.0010 classification due to role in advanced semiconductor mask manufacturing.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Include EUV wavelength specifications and defect detection algorithms documentation
• Prove integration with mask manufacturing workflow vs standalone metrology