E-Beam Mask Inspection System from China
High-resolution electron beam inspection detecting sub-20nm defects on patterned photomasks. Essential semiconductor mask manufacturing quality control under HTS 8486.40.0010.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Specify e-beam voltage, current density, and defect classification algorithms
• Document vacuum system specifications for mask handling without charging
• Prevent Chapter 90 classification by proving manufacturing line integration