Silicon Wafer Cleaning Station from China
Automated cleaning stations remove particles and contaminants from semiconductor wafers using megasonic, brush, or chemical methods before processing. Falls under HTS 8486.20.00.00 for semiconductor manufacturing apparatus. Critical for yield in device fabrication.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Specify particle removal efficiency (e.g
• <0.1um); include chemical compatibility lists; validate cleanroom class certification