Dielectric Film Sputtering System from Mexico
Sputter deposition systems apply dielectric and metal thin films to semiconductor wafers using plasma sputtering targets. HTS 8486.20.00.00 for IC manufacturing apparatus. Provides pinhole-free films.
Duty Rate — Mexico → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Target material/deposition rate specs; vacuum pump compatibility; argon gas purity docs