Dielectric Film Sputtering System from China
Sputter deposition systems apply dielectric and metal thin films to semiconductor wafers using plasma sputtering targets. HTS 8486.20.00.00 for IC manufacturing apparatus. Provides pinhole-free films.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Target material/deposition rate specs; vacuum pump compatibility; argon gas purity docs