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Dielectric Film Sputtering System from China

Sputter deposition systems apply dielectric and metal thin films to semiconductor wafers using plasma sputtering targets. HTS 8486.20.00.00 for IC manufacturing apparatus. Provides pinhole-free films.

Duty Rate — China → United States

25%

Rate breakdown

9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.05.860%Universal product exemption (U.S. note 52(b))

Import Tips

Target material/deposition rate specs; vacuum pump compatibility; argon gas purity docs

Dielectric Film Sputtering System from China — Import Duty Rate | HTS 8486.20.00.00