Chemical Vapor Deposition Furnace from Mexico
CVD furnaces deposit thin films of insulators, metals, or semiconductors onto wafers via gas-phase reactions for IC layers. HTS 8486.20.00.00 for semiconductor processing apparatus. Enables conformal coatings.
Duty Rate — Mexico → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• List precursor gases and temperature ranges; precursor handling safety data; uniform deposition proof