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8486.20.00.00/Chemical Vapor Deposition Furnace/Mexico

Chemical Vapor Deposition Furnace from Mexico

CVD furnaces deposit thin films of insulators, metals, or semiconductors onto wafers via gas-phase reactions for IC layers. HTS 8486.20.00.00 for semiconductor processing apparatus. Enables conformal coatings.

Duty Rate — Mexico → United States

0%

Rate breakdown

9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
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Import Tips

• List precursor gases and temperature ranges; precursor handling safety data; uniform deposition proof

Chemical Vapor Deposition Furnace from Mexico — Import Duty Rate | HTS 8486.20.00.00