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8486.20.00.00/Chemical Vapor Deposition Furnace/China

Chemical Vapor Deposition Furnace from China

CVD furnaces deposit thin films of insulators, metals, or semiconductors onto wafers via gas-phase reactions for IC layers. HTS 8486.20.00.00 for semiconductor processing apparatus. Enables conformal coatings.

Duty Rate — China → United States

25%

Rate breakdown

9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
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Import Tips

• List precursor gases and temperature ranges; precursor handling safety data; uniform deposition proof

Chemical Vapor Deposition Furnace from China — Import Duty Rate | HTS 8486.20.00.00