Chemical Mechanical Wafer Polisher from China
CMP (Chemical Mechanical Polishing) tools polish semiconductor wafers to atomic-level flatness using slurry and pads, vital for IC layer planarization. Under HTS 8486.20.00.00 for semiconductor device manufacturing apparatus. Removes material uniformly for multi-layer device stacking.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Include slurry flow/pressure specs proving CMP function; ensure endpoint detection system documentation; comply with chemical handling regulations