Numatics Proportional Valve G3 Series from Japan
Pneumatic actuator valve for precise slurry flow control in CMP polishers during semiconductor wafer processing. HTS 8481.80.9035 due to proportional operation by process controller signals. Essential for uniform material removal rates in wafer surface planarization.
Duty Rate — Japan → United States
12%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Specify chemical resistance for CMP slurries (e.g
• silica-based) in material certs
• Avoid reclassification by documenting individual valve signal input vs manifold control
• Check Section 301 exclusions for semiconductor processing equipment