Numatics Proportional Valve G3 Series from China
Pneumatic actuator valve for precise slurry flow control in CMP polishers during semiconductor wafer processing. HTS 8481.80.9035 due to proportional operation by process controller signals. Essential for uniform material removal rates in wafer surface planarization.
Duty Rate — China → United States
37%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Import Tips
• Specify chemical resistance for CMP slurries (e.g
• silica-based) in material certs
• Avoid reclassification by documenting individual valve signal input vs manifold control
• Check Section 301 exclusions for semiconductor processing equipment