Float Zone Crystal Furnace from Mexico
Equipment employing the float zone method to produce extremely pure monocrystalline semiconductor boules without a crucible. Classified in HTS 8479.90.95 as other semiconductor manufacturing machinery having individual functions. Used primarily for high-resistivity silicon wafers.
Duty Rate — Mexico → United States
15%
Rate breakdown
9903.82.1015%Except as provided for in headings 9903.82.12, 9903.82.17 and 9903.85.68, derivative aluminum and steel articles with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 15 percent, as provided for in subdivision (f) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Include process flow diagrams showing float zone method to confirm semiconductor-specific use
• Labeling must specify polycrystalline rod feedstock and RF heating system components