Float Zone Crystal Furnace from Canada
Equipment employing the float zone method to produce extremely pure monocrystalline semiconductor boules without a crucible. Classified in HTS 8479.90.95 as other semiconductor manufacturing machinery having individual functions. Used primarily for high-resistivity silicon wafers.
Duty Rate — Canada → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include process flow diagrams showing float zone method to confirm semiconductor-specific use
• Labeling must specify polycrystalline rod feedstock and RF heating system components