Semiconductor Wafer Polishing Head Carrier Ring from Germany
Carrier ring for chemical mechanical polishing (CMP) heads that hold wafers during final surface preparation for device fabrication. Classified under HTS 8479.90.95.65 as parts of wafer polishing machines treating semiconductor metal surfaces.
Duty Rate — Germany → United States
15%
Rate breakdown
9903.82.1015%Except as provided for in headings 9903.82.12, 9903.82.17 and 9903.85.68, derivative aluminum and steel articles with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 15 percent, as provided for in subdivision (f) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Specify pad groove patterns and retainer clip dimensions for specific CMP tool models
• Include material safety data for chemical resistance to slurry compositions
• Document edge exclusion zone performance for yield optimization