Float Zone Crystal Grower from Japan
Equipment employing the float zone method to refine and grow high-purity silicon crystals by melting a narrow zone of polycrystalline rod without a crucible. Classified in 8479.82.0080 for semiconductor-specific grinding and homogenization processes.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Provide float zone RF heating specs and silicon resistivity documentation for proper statistical note application
• Label as 'semiconductor crystal grower' to distinguish from general melting equipment