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Diamond Wafer Polishing System from Germany

Chemical mechanical polishing (CMP) system using diamond abrasives to achieve mirror finish on semiconductor wafers for device fabrication. 8479.82.0080 as specialized wafer grinding/polishing apparatus.

Duty Rate — Germany → United States

10%

Rate breakdown

9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%

Import Tips

Document removal rate specs and surface roughness (Ra <0.2nm typical)

Include chemical slurry compatibility certification

Diamond Wafer Polishing System from Germany — Import Duty Rate | HTS 8479.82.00.80