Semiconductor Wafer Lapper from Japan

Wafer lappers use loose abrasives to achieve initial flatness on semiconductor wafers before polishing. Classified HTS 8479.30.00.00 per statistical note (a)(ii)(C) for wafer preparation.

Duty Rate — Japan → United States

10%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter

Import Tips

Document lapping plate flatness specs (e.g

<1μm across 300mm wafer)

Ensure slurry handling system designed for colloidal silica, not general abrasives

Avoid pitfall of classifying as general metal lapping machines