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8474.80.00.15/Crystal Annealing Furnace/Japan

Crystal Annealing Furnace from Japan

High-temperature furnace for annealing semiconductor crystals post-grinding to relieve stresses before wafer slicing. HTS 8474.80.0015 when integral to mineral shaping process.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Specify temperature uniformity (±1°C) for crystal integrity

• Document as part of boule preparation sequence