CMP Wafer Polishing Pad Conditioner from Japan
Diamond disk conditioner for dressing chemical mechanical polishing (CMP) pads used in 8472.90.50 polishers during semiconductor wafer fabrication. Maintains pad surface asperity for uniform material removal. Fits as accessory in HTS 8473.40.41.00.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Detail diamond pattern (e.g
• hexagonal, crosshatch) and pad compatibility (400-600mm)
• Include CMP process validation data linking to semiconductor wafer planarity specs