Photoresist Spinner Drive Electronics from Mexico
PCA controlling high-speed spin coating of photoresist on semiconductor wafers in lithography prep stations. Fits HTS 8473.30.1180 as dedicated printed circuit part for 8471 coating machines, no CRT. Achieves uniform thin-film deposition.
Duty Rate — Mexico → United States
25%
Rate breakdown
9903.79.0125%Semiconductor articles as provided for in subdivisions (a) and (b) of U.S. note 39 to this subchapter
9903.05.860%Universal product exemption (U.S. note 52(b))
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Spin speed specs (>3000 RPM) prove semiconductor use
• Volatile chemical exposure ratings required
• Avoid bulk chemical import bundling