Ion Implanter Beamline Control PCA from Japan
PCA regulating ion beam current, energy, and scan in ion implanters doping semiconductor wafers. Classified HTS 8473.30.1180 as part for 8471 implantation machines, no CRT. Dose uniformity <1% achieved.
Duty Rate — Japan → United States
25%
Rate breakdown
9903.79.0125%Semiconductor articles as provided for in subdivisions (a) and (b) of U.S. note 39 to this subchapter
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Mass spec resolution specs required
• Vacuum bakeout procedures documented
• Radiation shielding declarations