8471.90.00.00/Automated Wafer Cleaning Station/Mexico

Automated Wafer Cleaning Station from Mexico

Robotic station that cleans semiconductor wafers post-preparation using megasonic, brush, and chemical cleaning. HTS 8471.90.00.00 as integrated semiconductor processing equipment.

Duty Rate — Mexico → United States

25%

Rate breakdown

9903.94.0525%Except for products described in headings 9903.94.06, 9903.94.32, 9903.94.33, 9903.94.42, 9903.94.43, 9903.94.44, 9903.94.45, 9903.94.52, 9903.94.53, 9903.94.54, 9903.94.55, 9903.94.62, 9903.94.63, 9903.94.66 and 9903.94.67, automobile parts, as provided for in subdivision (g) of U.S. note 33 to this subchapter

9903.05.860%Universal product exemption (U.S. note 52(b))

9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)

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Import Tips

• Detail cleaning chemistries, megasonic frequencies, and particle removal efficiency

• Include cleanroom compatibility and effluent treatment specifications

• Prevent chemical washer classification with semiconductor particle specs