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Hand Pneumatic Wafer Surface Lapper from Mexico

Pneumatic handheld lapper for semiconductor wafer surface flattening before polishing steps. Fits HTS 8467.19.50.90 as wafer preparation equipment tool. Achieves sub-micron flatness for device fabrication.

Duty Rate — Mexico → United States

10%

Rate breakdown

9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter

Import Tips

Detail lap plate flatness tolerance (<1um) in specs

Pair with slurry SDS for hazmat compliance

Don't import loose laps; classify as sets

Hand Pneumatic Wafer Surface Lapper from Mexico — Import Duty Rate | HTS 8467.19.50.90