Hand Pneumatic Wafer Surface Lapper from Japan
Pneumatic handheld lapper for semiconductor wafer surface flattening before polishing steps. Fits HTS 8467.19.50.90 as wafer preparation equipment tool. Achieves sub-micron flatness for device fabrication.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Detail lap plate flatness tolerance (<1um) in specs
• Pair with slurry SDS for hazmat compliance
• Don't import loose laps; classify as sets