Semiconductor Wafer Lapping Plate from China
Cast iron lapping plate for wafer grinders/lappers of heading 8465, provides flat reference surface for bringing silicon wafers to critical thickness tolerances before polishing. Designed for loose abrasive slurry processes in semiconductor fabrication prep. Principal part under 8466.92.5050.
Duty Rate — China → United States
39.7%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Specify flatness tolerance (e.g
• <1 micron) and slurry compatibility in technical data sheets
• Include process flow documentation showing pre-polish lapping stage in wafer manufacturing