Gallium Arsenide Wafer Polisher from Japan
Polishing machine for compound semiconductor wafers like gallium arsenide, bringing surfaces to mirror finish required for device fabrication per statistical note (a)(ii)(C). Fits HTS 8464.20.0120 for polishing machines working like mineral materials. Used after lapping to prepare wafers for photolithography.
Duty Rate — Japan → United States
12%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Provide material compatibility certificates for GaAs; declare as 'wafer polishing equipment' with statistical note reference; consider FTZ for high-value semiconductor tools