Numerically Controlled Wafer Lapping Machine from Japan

A precision numerically controlled machine used in semiconductor manufacturing to lap silicon wafers, achieving ultra-flat surfaces within tight tolerances for subsequent fabrication processes. It falls under HTS 8460.90.4060 as a numerically controlled grinding/lapping machine for finishing metal (silicon wafers are metallically processed). Designed specifically for preparing semiconductor wafers from crystal boules.

Duty Rate — Japan → United States

14.4%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter

Import Tips

Verify numerical control features and wafer-specific adaptations in technical specs to confirm classification under 8460.90.4060

Include detailed end-use documentation proving semiconductor application to avoid reclassification to general machinery

Ensure vibration isolation and cleanroom compatibility certifications to meet import standards for high-precision tools