Synchrotron Photon Etching Station from Japan
Lab-scale station using synchrotron-generated soft X-ray photons for photochemical etching of semiconductor surfaces. Under HTS 8456.12.90.00 as specialized photon beam material removal tool. For R&D in novel device structures.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Research exemption paperwork if for university/non-commercial use
• Radiation shielding specs required for X-ray photon systems