Plasma-Induced Photon Beam Ablator from Japan
Hybrid system generating photons via plasma discharge for selective material ablation in wafer preparation. Classified HTS 8456.12.90.00 for photon beam processes distinct from direct plasma arc. Used for surface cleaning before epitaxy.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide plasma-photon coupling physics docs to avoid plasma arc classification
• Ensure gas handling systems comply with hazmat import rules