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8456.12.90.00/Ionic Beam Etching Tool/Japan

Ionic Beam Etching Tool from Japan

Uses focused ionic beams (charged particle streams with photon assist) for anisotropic etching of semiconductor surfaces during device fabrication. HTS 8456.12.90.00 covers other light/photon beam processes including ionic variants for material removal. Key for gate formation in advanced nodes.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Clarify ionic vs pure electron/ion beam; photon component justifies this heading over plasma arc

• Include vacuum chamber specs and throughput data for valuation