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8456.12.90.00/Excimer Laser Ablation System/Mexico

Excimer Laser Ablation System from Mexico

An excimer-based photon beam system for photoablation of thin films in semiconductor device fabrication, removing material layer-by-layer without thermal damage. Classified in HTS 8456.12.90.00 for other light/photon beam processes beyond standard lasers. Ideal for patterning insulators and metals on wafers.

Duty Rate — Mexico → United States

12.4%

Rate breakdown

9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
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Import Tips

• Document excimer wavelength (e.g

• 193nm ArF) to distinguish from lasers; provide beam process diagrams

• Comply with export control regs (EAR/ITAR) for dual-use semiconductor tech; declare precise removal capabilities

Excimer Laser Ablation System from Mexico — Import Duty Rate | HTS 8456.12.90.00