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8455.21.00.00/GaAs Wafer Surface Polisher Hot Stage/Mexico

GaAs Wafer Surface Polisher Hot Stage from Mexico

Polishing equipment with integrated hot stage for gallium arsenide wafers to achieve mirror finish before fabrication. HTS 8455.21.00.00 as hot combination equipment in semiconductor wafer prep category.

Duty Rate — Mexico → United States

10%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
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Import Tips

• Specify CMP slurry compatibility and hot stage temps (200-400°C)

• Provide surface roughness specs (Ra <1nm)

• Document as post-slicing prep, not final fab polishing

GaAs Wafer Surface Polisher Hot Stage from Mexico — Import Duty Rate | HTS 8455.21.00.00