Float Zone Crystal Grower from Japan
Casting apparatus using the float zone method to produce extremely pure monocrystalline semiconductor boules without a crucible, ideal for high-resistivity silicon. Classified under HTS 8454.30.00 for its role as a metallurgy casting machine in semiconductor material production.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Provide technical datasheets detailing float zone process for semiconductor boule growth to support classification
• Ensure labeling distinguishes from wafer processing tools to prevent misclassification