Float Zone Crystal Grower from Japan
Casting apparatus using the float zone method to produce extremely pure monocrystalline semiconductor boules without a crucible, ideal for high-resistivity silicon. Classified under HTS 8454.30.00 for its role as a metallurgy casting machine in semiconductor material production.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide technical datasheets detailing float zone process for semiconductor boule growth to support classification
• Ensure labeling distinguishes from wafer processing tools to prevent misclassification