8454.30.00.90/Silicon Wafer Polishing Machine/Japan

Silicon Wafer Polishing Machine from Japan

Chemical-mechanical polishing (CMP) machines flatten semiconductor wafers to atomic-level smoothness for device fabrication. HTS 8454.30.00.90 includes this as other wafer preparation equipment (statistical note a)(ii)(C) in metallurgy casting context.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Calculate with your customs value Verify classification with AI

Import Tips

• Demonstrate surface roughness specs (Ångstroms) for proper classification

• Slurry handling systems need chemical import coordination