Silicon Wafer Cleaning Brush Roller from Mexico
PVA sponge brush roller part for post-grinding chemical cleaning stations removing slurry residue from semiconductor wafer surfaces. HTS 8451.90.90 as washing/cleaning machinery parts for wafer preparation. Critical for particle-free surfaces before lithography.
Duty Rate — Mexico → United States
13.5%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Document brush porosity (50-70 PPI), compression, and chemical resistance specs
• Specify megasonic or brush box compatibility for cleaning station integration