Silicon Wafer Cleaning Brush Roller from China
PVA sponge brush roller part for post-grinding chemical cleaning stations removing slurry residue from semiconductor wafer surfaces. HTS 8451.90.90 as washing/cleaning machinery parts for wafer preparation. Critical for particle-free surfaces before lithography.
Duty Rate — China → United States
41%
Rate breakdown
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Document brush porosity (50-70 PPI), compression, and chemical resistance specs
• Specify megasonic or brush box compatibility for cleaning station integration