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Silicon Wafer Cleaning Brush Roller from Canada

PVA sponge brush roller part for post-grinding chemical cleaning stations removing slurry residue from semiconductor wafer surfaces. HTS 8451.90.90 as washing/cleaning machinery parts for wafer preparation. Critical for particle-free surfaces before lithography.

Duty Rate — Canada → United States

13.5%

Rate breakdown

9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada

Import Tips

Document brush porosity (50-70 PPI), compression, and chemical resistance specs

Specify megasonic or brush box compatibility for cleaning station integration