Semiconductor Wafer Lapping Plate from Japan
Cast iron or ceramic lapping plate used in wafer grinders/lappers to achieve precise flatness and dimensional tolerances on semiconductor wafers before fabrication. Covered under HTS 8451.90.90 as parts of wafer preparation equipment analogous to textile finishing machinery. Critical for surface preparation in crystal growers/puller production lines.
Duty Rate — Japan → United States
13.5%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Certify plate material and flatness specs match statistical note requirements for semiconductor wafer processing
• Avoid bulk classification by providing machine model compatibility evidence