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8451.90.90/Gallium Arsenide Wafer Polisher Platen/Mexico

Gallium Arsenide Wafer Polisher Platen from Mexico

Ceramic platen for chemical polishing compound III-V wafers like GaAs requiring special surface chemistry. Part of wafer polishing equipment HTS 8451.90.90 statistical notes. Achieves sub-nanometer surface roughness for optoelectronic applications.

Duty Rate — Mexico → United States

13.5%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
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Import Tips

• Specify GaAs etch rate compatibility and platen material (alumina, tin oxide)

• Include surface roughness specs (Ra <0.5nm) proving polishing function