Gallium Arsenide Wafer Polisher Platen from Mexico
Ceramic platen for chemical polishing compound III-V wafers like GaAs requiring special surface chemistry. Part of wafer polishing equipment HTS 8451.90.90 statistical notes. Achieves sub-nanometer surface roughness for optoelectronic applications.
Duty Rate — Mexico → United States
13.5%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Specify GaAs etch rate compatibility and platen material (alumina, tin oxide)
• Include surface roughness specs (Ra <0.5nm) proving polishing function