Gallium Arsenide Wafer Polisher Platen from Japan
Ceramic platen for chemical polishing compound III-V wafers like GaAs requiring special surface chemistry. Part of wafer polishing equipment HTS 8451.90.90 statistical notes. Achieves sub-nanometer surface roughness for optoelectronic applications.
Duty Rate — Japan → United States
13.5%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Specify GaAs etch rate compatibility and platen material (alumina, tin oxide)
• Include surface roughness specs (Ra <0.5nm) proving polishing function