8451.90.90/Gallium Arsenide Wafer Polisher Platen/Japan

Gallium Arsenide Wafer Polisher Platen from Japan

Ceramic platen for chemical polishing compound III-V wafers like GaAs requiring special surface chemistry. Part of wafer polishing equipment HTS 8451.90.90 statistical notes. Achieves sub-nanometer surface roughness for optoelectronic applications.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Calculate with your customs value Verify classification with AI

Import Tips

• Specify GaAs etch rate compatibility and platen material (alumina, tin oxide)

• Include surface roughness specs (Ra <0.5nm) proving polishing function