Gallium Arsenide Wafer Polisher Platen from Germany
Ceramic platen for chemical polishing compound III-V wafers like GaAs requiring special surface chemistry. Part of wafer polishing equipment HTS 8451.90.90 statistical notes. Achieves sub-nanometer surface roughness for optoelectronic applications.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Specify GaAs etch rate compatibility and platen material (alumina, tin oxide)
• Include surface roughness specs (Ra <0.5nm) proving polishing function