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Gallium Arsenide Wafer Polisher Platen from Germany

Ceramic platen for chemical polishing compound III-V wafers like GaAs requiring special surface chemistry. Part of wafer polishing equipment HTS 8451.90.90 statistical notes. Achieves sub-nanometer surface roughness for optoelectronic applications.

Duty Rate — Germany → United States

10%

Rate breakdown

9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%

Import Tips

Specify GaAs etch rate compatibility and platen material (alumina, tin oxide)

Include surface roughness specs (Ra <0.5nm) proving polishing function

Gallium Arsenide Wafer Polisher Platen from Germany — Import Duty Rate | HTS 8451.90.90