Wafer Lapping Machine from Mexico

Wafer lapping equipment that removes material from semiconductor wafers using abrasive slurries to achieve precise thickness uniformity. Under HTS 8448.20.50 as accessories for heading 8444 machines in semiconductor wafer preparation. Essential for total thickness variation (TTV) control before polishing.

Duty Rate — Mexico → United States

13.3%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter

Import Tips

Specify slurry compatibility with silicon/gallium arsenide in technical docs

Prove TTV control capability under 1 micron for proper classification

Wafer Lapping Machine from Mexico — Import Duty Rate | HTS 8448.20.50