CMP Wafer Polisher from Japan

Chemical Mechanical Planarization (CMP) polisher for final surface preparation of semiconductor wafers prior to device fabrication. HTS 8448.20.50 as other parts of heading 8444 auxiliary machinery for wafer processing. Achieves atomic-level flatness required for photolithography.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter

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Import Tips

• Document CMP slurry and pad systems designed for oxide/nitride polishing

• Include planarization rate specs proving semiconductor application

• Avoid misclassification as general polishers (8460) by showing nanometer surface roughness capability