Colloidal Silica Wafer Polisher from Japan
Polishers using colloidal silica slurry for final semiconductor wafer surface preparation. HTS 8443.99.5050 for wafer polishers per statistical notes. Creates oxide layer for device processing.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Include slurry specifications and removal rates
• Document cleanroom particle specs
• Differentiate from CMP via chemistry