Multi-Wafer Polishing Station from Mexico
Multi-wafer polishing stations process multiple semiconductor wafers simultaneously in carrier plates between upper/lower polishing pads. High-throughput final polish step. HTS 8442.30.0150 classification.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Specify throughput rates (wafers/hour) and batch sizes
• Include pad conditioning station integration
• Document cleanroom compatibility (Class 1 airflow)