Double-Side Wafer Polisher from Mexico
Double-side wafer polishers simultaneously polish both wafer surfaces between rotating pads using chemical-mechanical planarization (CMP) slurries. Achieves mirror finish required for device fabrication. Under HTS 8442.30.0150 as other polishing equipment.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Detail polishing pad materials (polyurethane, felt) and slurry chemistry (colloidal silica)
• Provide carrier film specifications for 200mm/300mm wafers
• Include downforce control precision (<0.1psi)