Wafer Polishing Machine from China
Wafer polishing machines use chemical-mechanical planarization (CMP) with slurries to create mirror-finish semiconductor wafer surfaces. Classified under HTS 8437.80.00 as statistical note equipment for final wafer surface preparation. Achieves atomic-level flatness required for device fabrication.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Declare CMP slurry systems separately if modular for accurate valuation
• Provide SEMI-standard compliance certifications for polishing uniformity