Semiconductor Wafer Grinder Vacuum Chuck from Japan
Porous ceramic vacuum chuck for holding 300mm silicon wafers during double-sided grinding to achieve parallelism tolerances. Solely for wafer grinder equipment of heading 8430. Other parts under 8431.49.90.
Duty Rate — Japan → United States
15%
Rate breakdown
9903.82.2215%Derivative steel articles the product of Argentina, Ecuador, El Salvador, Guatemala, Japan, the Republic of Korea, Liechtenstein, Switzerland, Taiwan, the United Kingdom, or a member nation of the European Union, as provided for in subdivision (c)(xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Include wafer size compatibility (200/300mm) and vacuum pressure specs
• Pitfall: generic chucks under 8414.10
• Requires ESD-safe material certification